High voltage solutions for E-beam lithography
Low temperature coefficient with no partial discharges
E-beam lithography allows the creation of nanoscale patterns in semiconductor manufacturing and research applications. However, partial discharge and low stability at high voltages impact the performance of e-beam lithography tools which can lead to lost revenue for semiconductor manufacturers.
High stability power supplies prevent yield issues
The stability, precision and performance needed in a power supply
Equipment damage due to short circuit and shielding issues is a problem for design engineers as it affects yield. To deliver the performance needed, e-beam tools require power solutions with high precision and a low temperature coefficient with no partial discharges.
Our integrated and customized solutions provide the high voltage stability, low ripple and short circuit protection you need.
High stability products for e-beam lithography applications
ET Series
Output voltages 0-1kVDC to 0-60k VDC
2U 19" rack mount
Single phase AC input
Efficiency >85%
Low ripple <0.03% RMS of rated voltage at full load
Voltage & current monitor outputs
WJ Series
Output voltages 0-70kVDC to 0-125kVDC
RS232/USB control & monitor standard, Ethernet is optional
Output voltage & current regulated
Air Insulated
CE marked for EMC, low voltage (LVD) & RoHS directives
Operating temperature: -20°C to +40°C
LQ Series
Output voltages 0-1kVDC to 0-12kVDC
Parallelable to 50kW
0 to 100% programmable voltage & current
Low ripple <0.1% RMS of rated voltage at full load
Voltage & current monitor outputs
3 phase 208VAC input standard, 200/380/415/480VAC options